This work reports the results of a study of Mo thin films synthesis by DC Pulsed Magnetron Sputtering method (PMS), operating at pulse main frequency of 100 kHz and modulated by the additional modulation frequency, driving in the range of 5-1000 Hz (modulated Pulse Magnetron Sputtering – mPMS). We have studied the influence of mPMS on plasma chemical reactions and mechanisms of layer growth using optical emission spectroscopy technique. Our experiment showed strong influence of mPMS method, on the morphology (scanning electron microscopy), phase composition (X-ray diffractometry) and electric properties (4-point probes method) of nanocrystalline and amorphous Mo films. From the utilitarian point of view, low value of resistivity – 43,2 μΩcm of synthesized Mo films predestines them as back contacts for thin solar cells CIGS. Our results revealed that additional modulation frequency should be considered as an important factor for optimization of films synthesis by means of PMS-based methods.

The article presents the method of magnetron sputtering for the deposition of conductive emitter coatings in semiconductor structures. The layers were applied to a silicon substrate. For optical investigations, borosilicate glasses were used. The obtained layers were subjected to both optical and electrical characterisation, as well as structural investigations. The layers on silicon substrates were tested with the four-point probe to find the dependence of resistivity on the layer thickness. The analysis of the elemental composition of the layer was conducted using a scanning electron microscope equipped with an EDS system. The morphology of the layers was examined with the atomic force microscope (AFM) of the scanning electron microscope (SEM) and the structures with the use of X-ray diffraction (XRD). The thickness of the manufactured layers was estimated by ellipsometry. The composition was controlled by selecting the target and the conditions of the application, i.e. the composition of the plasma atmosphere and the power of the magnetrons. Based on the obtained results, this article aims to investigate the influence of the manufacturing method and the selected process parameter on the optical properties of thin films, which should be characterised by the highest possible value of the transmission coefficient (>85–90%) and high electrical conductivity.

Still unsolved is the problem of monitoring the tissue regeneration with the use of implants (substrates) in in vivo conditions. The multitude of implant materials combined with their specific immanent often limit standard diagnostic methods, i.e. X-rey or computer tomography (CT). This is particularly difficult in therapies using polymeric high-resistance substrates for tissue engineering. The aim of this study was to fabricate a non-woven carbon fiber composed of carbon fibers (CF) which were then subjected to a surface modification by magnetron sputtering. A layer of iron (Fe) was applied under inert conditions (argon) for different time periods (2-10 min). It was shown that already after 2-4 minutes of iron sputtering, the voxel surface (CF_Fe2’, CF_Fe4’) was covered with a heterogeneous iron layer observed by scanning electron microscope (SEM) with energy dispersive X-ray analysis (EDS). The longer the modification time, the more uniform the layer on the fiber surface becomes. This can be seen by the change in the wettability of the nonwoven surface which decreases from 131° for CF_Fe2 to 120° for CF_Fe10. The fibers do not change their geometry or dimensions (~11.5 um). The determination of pore size distribution by adsorption and desorption techniques (BJH) and specific surface area by nitrogen adsorption method (BET) have shown that the high specific surface area for the CF_Fe2’ fibers decreases by 10% with the increasing iron sputtering time. All the studied CF_Fe fibers show good biocompatibility with osteoblast-like cells MG-63 cells after both 3 and 7 days of culture. Osteoblasts adhere to the fiber surface and show correct morphology.

The paper reports the results of a physical modelling study of the production of a hypereutectic aluminium alloy to be used for making an alloy vapour source for operation in the magnetron. Within the study, targets from a hypereutectic aluminium-silicon alloy were made in laboratory conditions. Thus obtained material was subjected to heat treatment, porosity analysis, and the assessment of the microstructure and fitness for being used in the magnetron. The process of melting the hypereutectic Al-Si alloy was carried out at the Department of Foundry of the Czestochowa University of Technology. The investigation into the production of the alloy vapour source for the synthesis of the dielectric material from the hypereutectic aluminium alloy has confirmed.

In this study, solar cells based on copper oxide and titanium dioxide were successfully manufactured using the reactive direct-current magnetron sputtering (DC-MS) technique with similar process parameters. TiO2/CuO, TiO2/Cu2O/CuO/Cu2O, and TiO2/Cu2O solar cells were manufactured via this process. Values of efficiencies, short-circuit current, short-circuit current density, open-circuit voltage, and maximum power of PV devices were investigated in the range of 0.02÷0.9%, 75÷350 µA, 75÷350 µA/cm2, 16÷550 mV, and 0.6÷27 µW, respectively. The authors compare solar cells reaching the best and the worst conversion efficiency results. Thus, only the two selected solar cells were fully characterized using I-V characteristics, scanning electron microscopy, X-ray diffraction, ellipsometry, Hall effect measurements, and quantum efficiency. The best conversion efficiency of a solar cell presented in this work is about three times higher in comparison with the authors’ previous PV devices.

The present research work involves the study of the 3-D surface microtexture of sputtered indium tin oxide (ITO) prepared on glass substrates by DC magnetron at room temperature. The samples were annealed at 450°C in air and were distributed into five groups, dependent on ambient combinations applied, as follows: I group, using argon (Ar); II group, using argon with oxygen (Ar+O2); III group, using argon with oxygen and nitrogen (Ar+O2+N2); IV group, using argon with oxygen and hydrogen (Ar+O2+H2); and V group, using argon with oxygen, nitrogen, and hydrogen (Ar+O2+N2+H2). The characterization of the ITO thin film surface microtexture was carried out by atomic force microscopy (AFM). The AFM images were stereometrically quantitatively analyzed to obtain statistical parameters, by ISO 25178-2: 2012 and ASME B46.1-2009. The results have shown that the 3-D surface microtexture parameters change in accordance with different fabrication ambient combinations.

Al doped ZnO has been explored as a viable alternative to indium thin oxide, which is usually used as transparent electrodes' coverage but is expensive. Homogenous and durable ZnO:Al layers on glass have been obtained in radio frequency magnetron sputtering system by adjusting optimized deposition parameters, using ZnO ceramic target with 2 wt% Al₂O₃. Then, after growth process, annealing treatment has been introduced in order to improve the quality of the layers. Structural, electrical and optical properties of the obtained ZnO:Al layers are presented and discussed. From the application point of view, the best results (sheet resistance of 24 Ω/sq and transparency well above 85%) were achieved after annealing in 300°C.