In this paper ∼16 μm-emitting multimode InP-related quantum cascade lasers are presented with the maximum operating temperature 373 K, peak and average optical power equal to 720 mW and 4.8 mW at 303 K, respectively, and the characteristic temperature (T₀) 272 K. Two types of the lasers were fabricated and characterized: the lasers with a SiO₂ layer left untouched in the area of the metal-free window on top of the ridge, and the lasers with the SiO₂ layer removed from the metal-free window area. Dual-wavelength operation was obtained, at λ ∼ 15.6 μm (641 cm⁻¹) and at λ ∼ 16.6 μm (602 cm⁻¹) for lasers with SiO₂ removed, while within the emission spectrum of the lasers with SiO₂ left untouched only the former lasing peak was present. The parameters of these devices like threshold current, optical power and emission wavelength are compared. Lasers without the SiO₂ layer showed ∼15% lower threshold current than these ones with the SiO₂ layer. The optical powers for lasers without SiO₂ layer were almost twice higher than for the lasers with the SiO₂ layer on the top of the ridge.

The authors report two approaches, the first based on growth of lattice matched InGaAs/GaAsSb superlattice on InP substrate with tunable bandgap in the 2 to 3 µm range. The second approach is based on bulk random alloy InGaAsSb, which is tunable from 1.7 µm to 4.5 µm and lattice matched to the GaSb lattice constant. In each case, detector structures were fabricated and characterised. The authors have assessed the performance of these materials relative to commercially available extended short wave infrared devices through comparison to IGA-Rule 17 dark current performance level. A complementary barrier structure used in the InGaAsSb design showed improved quantum efficiency. The materials compare favourably to commercial technology and present additional options to address the challenging extended short wave infrared spectral band.

In this study, an analysis of the optical performance of two types of distributed Bragg reflector structures based on GaAs and InP material systems was carried out. The structures were designed for maximum performance at 4 µm with their reflectivity achieving between 80 and 90% with eight pairs of constituent layers. To further enhance the performance of these structures, additional Au layers were added at the bottom of the structure with Ti pre-coating applied to improve the adhesivity of the Au to the semiconductor substrate. The optimal range of Ti layer thickness resulting in the improvement of the maximum reflectivity was determined to be in between 5 and 15 nm.

The design and performance analysis of a 1310/1550-nm wavelength division demultiplexer with tapered geometry based on InP/InGaAsP multimode interference (MMI) coupler has been carried out. Wavelength response of demultiplexer of conventional MMI and tapered input and tapered output (tapered I/O) waveguides geometry of the MMI have been discussed. The demultiplexing function has been first performed by choosing a suitable refractive index of the guiding region and geometrical parameters such as the width and length of MMI structure have been achieved. Access width of tapered I/O waveguides have been adjusted to give a low insertion loss (IL) and high extinction ratio (ER) for the considered wavelengths of 1310 nm and 1550 nm. The total size of the demultiplexer has been significantly reduced over the existing MMI devices. Numerical simulations with finite difference beam propagation method are applied to design and optimize the operation of the proposed demultiplexer.

The work presents doping characteristics and properties of high Si−doped InGaAs epilayers lattice−matched to InP grown by low pressure metal−organic vapour phase epitaxy. Silane and disilane were used as dopant sources. The main task of investigations was to obtain heavily doped InGaAs epilayers suitable for usage as plasmon−confinement layers in the construction of mid−infrared InAlAs/InGaAs/InP quantum−cascade lasers (QCLs). It requires the doping concentration of 1×10¹⁹ cm^–3 and 1×10²⁰ cm^–3 for lasers working at 9 μm and 5 μm, respectively. The electron concentration increases linearly with the ratio of gas−phase molar fraction of the dopant to III group sources (IV/III). The highest electron concentrations suitable for InGaAs plasmon−contact layers of QCL was achieved only for disilane. We also observed a slight influence of the ratio of gas−phase molar fraction of V to III group sources (V/III) on the doping efficiency. Structural measurements using high−resolution X−ray diffraction revealed a distinct influence of the doping concentration on InGaAs composition what caused a lattice mismatch in the range of –240 ÷ –780 ppm for the samples doped by silane and disilane. It has to be taken into account during the growth of InGaAs contact layers to avoid internal stresses in QCL epitaxial structures.