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Abstract

The report presents the results of selected heavy metals (Zn, Cu, Cd, Ni, Pb) removal from industrial wastewater sludge collected from metallurgy industry. As washing solutions two chelating agents were used: EDTA and citric acid. The study was focused on 0.000 (deionized water), 0.010, 0.050, 0.075, 0.100 M and 0.000, 0.050, 0.100, 0.500, 1.000 M, EDTA and citric acid solutions, respectively.

Efficiency of EDTA and citric acid solutions for metal removal was studied by extraction of sludge samples with chelators. Chemical extraction of selected metals was effective for both types of solution. Optimal concentration of EDTA was 0.100M for Zn, Ni and Cd, 0.075 M for Cu and Pb. Optimal concentration of citric acid was 0.500 M for all analyzed metals

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Authors and Affiliations

Beata Karwowska
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Abstract

The possibility of Cu(II), Ni(II) and Sn(II) removal from model solutions and real wastewater from

the production of PCBs using Na2

CS3

for precipitation was presented in this paper. The testing was carried out

on a laboratory scale using model and real industrial wastewater containing additives in the form of complexing

compounds used in the production of PCBs (Na2

EDTA, NH3(aq), thiourea) and recommended by the USEPA

(Na3

MGDA, Na4

GLDA). Application of Na2

CS3

in optimal conditions of conducting precipitation process was

connected with obtaining wastewater containing low concentrations of metals (Cu 0.02 mg/L, Sn <0.01 mg/L, Ni

<0.005 mg/L at pH 9.39 and Cu 0.07 mg/L, Sn <0.01 mg/L, Ni 0.006 mg/L at pH 7.79). Controlled application of

Na2

CS3

by the use of a platinum redox electrode was also connected with obtaining treated wastewater containing

low concentrations of metals (Cu 0.019 mg/L, Sn <0.05 mg/L, Ni <0.0098 mg/L at pH 9–9.5 and E= -142 mV in the

laboratory scale and Cu 0.058 mg/L, Sn <0.005 mg/L, Ni 0.011 mg/L at pH 9.14 and E= +10 mV in the industrial

scale). Changing the value of redox potential of treated wastewater by dosing Na2

CS3

made it possible to control

the precipitation process on laboratory and industrial scale by the use of a platinum redox electrode. Controlled

application of Na2

CS3

can be used to remove Cu(II), Ni(II) and Sn(II) from industrial effl uent containing chelating

compounds like Na2

EDTA, NH3(aq), thiourea, Na3

MGDA and Na4

GLDA.

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Authors and Affiliations

Barbara Białecka
Maciej Thomas
Dariusz Zdebik

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