The paper reports the results of a physical modelling study of the production of a hypereutectic aluminium alloy to be used for making an alloy vapour source for operation in the magnetron. Within the study, targets from a hypereutectic aluminium-silicon alloy were made in laboratory conditions. Thus obtained material was subjected to heat treatment, porosity analysis, and the assessment of the microstructure and fitness for being used in the magnetron. The process of melting the hypereutectic Al-Si alloy was carried out at the Department of Foundry of the Czestochowa University of Technology. The investigation into the production of the alloy vapour source for the synthesis of the dielectric material from the hypereutectic aluminium alloy has confirmed.

This work reports the results of a study of Mo thin films synthesis by DC Pulsed Magnetron Sputtering method (PMS), operating at pulse main frequency of 100 kHz and modulated by the additional modulation frequency, driving in the range of 5-1000 Hz (modulated Pulse Magnetron Sputtering – mPMS). We have studied the influence of mPMS on plasma chemical reactions and mechanisms of layer growth using optical emission spectroscopy technique. Our experiment showed strong influence of mPMS method, on the morphology (scanning electron microscopy), phase composition (X-ray diffractometry) and electric properties (4-point probes method) of nanocrystalline and amorphous Mo films. From the utilitarian point of view, low value of resistivity – 43,2 μΩcm of synthesized Mo films predestines them as back contacts for thin solar cells CIGS. Our results revealed that additional modulation frequency should be considered as an important factor for optimization of films synthesis by means of PMS-based methods.