Title

A stack multilayer high reflectance optical filter produced on polyester substrate with the PECVD technique

Journal title

Bulletin of the Polish Academy of Sciences Technical Sciences

Yearbook

2009

Volume

vol. 57

Issue

No 2

Authors

Kowalski, J. ; Szymanowski, H. ; Sobczyk-Guzenda, A. ; Gazicki-Lipman, M.

Divisions of PAS

Nauki Techniczne

Coverage

171-176

Date

2009

Identifier

DOI: 10.2478/v10175-010-0118-z ; ISSN 2300-1917

Source

Bulletin of the Polish Academy of Sciences: Technical Sciences; 2009; vol. 57; No 2; 171-176

References

Larouche S. (2004), Microstructure of plasma-deposited SiO₂/TiO₂ optical films, J. Vac. Sci. Techn, A 22, 4, 1200. ; Gruniger A. (2003), Deposition of SiO₂-like diffusion barriers on PET and paper by PECVD, Surf. Coat. Techn, 174-175, 1043, doi.org/10.1016/S0257-8972(03)00327-X ; Bieder A. (2005), Deposition of SiO_x diffusion barriers on flexible packaging materials by PECVD, Surf. Coat. Techn, 200, 928, doi.org/10.1016/j.surfcoat.2005.02.004 ; Martin-Palma R. (2006), Optical and compositional analysis of functional SiO_xC_y:H coatings on polymers, Thin Solid Films, 515, 2493, doi.org/10.1016/j.tsf.2006.07.082 ; Masse J. (2006), Stability and effect of annealing on the optical properties of plasma-deposited Ta₂O₅ and Nb₂O₅ films, Thin Solid Films, 515, 1674, doi.org/10.1016/j.tsf.2006.05.047 ; Palma R. (2006), Optical and compositional analysis of functional SiO_xC_y:H coatings on polymers, Thin Solid Films, 515, 2493. ; Bauer S. (2003), Optical multilayers for ultra-narrow bandpass filters fabricated by PICVD, Thin Solid Films, 442, 189, doi.org/10.1016/S0040-6090(03)00981-7 ; Jaworske D. (1998), Characterization of silicon thin film deposited by e-beam, Thin Solid Films, 332, 30. ; Neuman G. (1997), The use of experimental design techniques to meet reflected color targets in pyrolytic low emissivity coatings, Thin Solid Films, 308-309, 26, doi.org/10.1016/S0040-6090(97)00532-4 ; Eliahou-Niv S. (2006), Design and analysis of a novel tunable optical filter, Microelectr. J, 37, 302, doi.org/10.1016/j.mejo.2005.05.018